Technical Information
Basic technologies
- Organic synthesis / polymerization technologies
Diazotization, Azidation, Esterification, Oxidation, Grignard reaction, Lithiation, Diels-Alder reaction, Radical polymerization - Low metal management technologies
- Impurity management technologies
- Solvent recovery technologies
- Scale-up engineering technologies
- Small-volume multi-product / multi-stage synthesis technologies
production equipment
1) Chiba factory mass production equipment
The Chiba Plant has three product manufacturing plants and mass-produces photosensitive materials and polymers for photoresists.
First photosensitive material plant
Second photosensitive material plant
Third photosensitive material plant
Chiba second plant
Photosensitive material reaction equipment
Shelf drying machine
PAG reaction equipment
Waste liquid treatment equipment
Cold storage warehouse
2) Pilot equipment
The Process Development Laboratory's pilot facility mainly manufactures prototypes of photoresist photosensitive materials.
3) Analysis equipment
ICP-MS, NMR, GPC, IC, HPLC, GC-MS, KF moisture meter, Density meter, Refractometer, Spectrophotometer, FT-IR, Automatic titrator, DSC, LC-MS
GPC(APC)
GPC
ICP-MS
HPLC
NMR
GC-MS