ArF Polymer Facilities Expansion and Thin-Film Evaporator Introduction
The entire Toyo Gosei Chiba factory is working as one to provide "at low cost with high quality" next-generation photosensitive materials that can work in concert with semiconductor manufacture as the degree of integration rises.
The dedicated ArF resin manufacturing facilities were completed at the end of November 2002. After the completion of the facilities, we received more orders from our customers than foreseen. In order to meet the demand for ArF resin, which will steadily increase in the future, we are planning manufacturing facilities with annual production of 10-15 tons and will start up in the spring of 2004 in order to quickly answer our customers' requests.
For ArF resin, many products are being development through the combination of departure material monomers.
In order that many types of products can be used "quickly and with low cost", Toyo Gosei will tackle the entire series of work from raw material monomer synthesis to ArF resin manufacture. In October 2003, in order to efficiently refine raw material monomers, a thin-film evaporator is being introduced at the Chiba factory. By utilizing thin-film evaporators, it is possible to efficiently refine high-molecular weight material, which was difficult with conventional separation refining.
By expanding ArF resin facilities and introducing thin-film evaporators, we will adapt to future orders for steadily diversifying ArF resin products for which product demand will expand.
