Recent State of Third Photosensitive Material Factory
The third photosensitive materials factory at Toyo Gosei Co., Ltd.'s Chiba factory was completed in January 2001. In order to obtain the certification of new facilities by resist manufacturers, trial production was carried out and certification obtained. The production capacity of these new facilities is 200 tons/year and will be increased to 300 tons/year through the reinforcement of some facilities. In order to meet customer needs and with the objectives of "high quality", "stable quality", and "low cost", the NQD-ester manufacturing facilities of the third photosensitive material factory "has managed processes with all-process computer control", "has lowered cost through larger facilities", and "has reduced labor needs by introducing robots in the drying and filling processes".
As a result, Toyo Gosei has become able to supply users with stable quality free of quality fluctuations between product lots.
Inversion type centrifuge separator
The semiconductor industry has been unable to shake itself free of recession, but Toyo Gosei photosensitive materials are supported in applications other than micro-photo-resist and operating ratios are steadily improving. Also, currently continuing on the KrF photo-resist resin manufacturing facilities in the space within the factory, dedicated facilities are under construction for polymer resins for ArF photo-resist. Accompanying this, it is planned to further raise the degree of cleanness within the factory. Space for expansion has also been secured so that it will be possible to meet future expanded demand.
In response to customer needs, evaluation samples will be produced within the year and we will request evaluation of their quality.
Stimulated by the introduction of TPM (Total Productive Maintenance) activities, all the employees of the new factory are tackling production from the same angle of providing "high quality and low price" to meet the desires of all our customers.
