Construction of dedicated facilities from ArF resin manufacturing facilities (multi-use support)
It has been 14 years since manufacturing of bis-azide family photosensitive materials, water-soluble photosensitive materials (including chrome-free CRT materials), organic alkaline developing solutions, positive-type photosensitive materials (naphthoquinone family), and photooxidation agents (PAG) began within the Toyo Gosei Chiba factory. With the integration of semiconductors moving steadily forward, in February 2002, we completed KrF photoresist resin manufacturing facilities in order to supply our customers with the next-generation photosensitive materials with "high quality and low cost".
Among ArF resin, the use of methacrylate ester, adamantine compounds, and other polymers is becoming the mainstream, but each resist manufacturing company is moving forward with its own development.
In order to quickly meet the desires of photo-resistor manufacturers, Toyo Gosei completed its ArF resin manufacturing facilities (multi-use) for 193nm in March 2002.
Construction to convert from a multi-product factory to dedicated facilities has started with the objective of completion by the end of November 2002. These facilities are equipped with dissolving vessels, reaction vessels, crystallization vessels, centrifuge separators, dryers, and filters. The introduction of process computers for process management and the conversion of the factory to clean status is proceeding and plans give top priority to quality.
A production capacity of 500kg per month or more is planned, but in order to handle increased demand, facilities space (for monthly production of 2,000 kg or more) is being secured and at the same time, a system is being put in place to make possible timely supply.
All our employees are tackling production from the same angle of using the fruits of the introduction of TPM (Total Productive Maintenance) to provide "high quality and low price".
