Water-soluble photo-resist for CRT black matrix formation
The TGK-R type and TGK-A type are water-soluble photo-resist for the formation of black matrices (BM) developed for CRTs. Compared to conventional photo-resist (PVP+DAS), these new types have high sensitivity and high resolution. Photo-resist sensitivity adjustment is possible, as is the adjustment of reciprocal side irregularity indispensable for black matrix production, so these new types can be used on a wide variety of manufacturing lines.
