KrF photoresist resin manufacturing facilities completed
Within the Toyo Gosei Chiba factory, there are bis-azide family photosensitive material manufacturing facilities, water-soluble photosensitive material manufacturing facilities (including chrome-free CRT materials), and organic alkaline developing solution manufacturing facilities and positive-type photosensitive material manufacturing facilities (naphthoquinone family). These facilities have been in operation for 14 years.
With the integration of semiconductors moving steadily forward, in February 2002, we completed KrF photoresist resin manufacturing facilities in order to supply our customers with the next-generation photosensitive materials with "high quality and low cost".
It is known that KrF photo-resist materials are used adding photooxidation agent (PAG) to the material in which the protecting group is introduced in PHS (polyhydroxystyrene). Toyo Gosei's PAG is already on the market and has achieved high marks.
The resin manufacturing facilities are dedicated to adding the protecting group (blocking) to PHS (polyhydroxystyrene). These facilities are equipped with reaction vessels, filtration machines, crystallization vessels, dissolving vessels, centrifuge separators, dryers, clean booths, and filters and products can be supplied as "powder" or "liquid", whichever the user desires.
All our employees are tackling production from the same angle of using the fruits of the introduction of TPM (Total Productive Maintenance) to provide "high quality and low price".
