Completion of dedicated equipment for chemical accelerators
Photo-resist for semiconductors is shifting from infrared (UV) to KrF laser chemical amplification types.
As a specialized manufacturer of photosensitive materials, Toyo Gosei has greatly altered its Chiba factory N/E-(I) family in order to be able to provide full-scale supply of the most advanced materials. This device is a dedicated blocking device that adds the protecting group to PHS (polyhydroxystyrene). Blocking can be used for multiple purposes, be it the acetal or SCAP family and a variety of know-how has been built into this device so that the supply to the reactor vessel, the amount, the reaction temperature, stirring, etc. can be controlled with even higher precision. Of course, this device can provide products with unmatched quality.
Operation of this device started in November 2001 and it boasts a production capacity of 3 tons per month and 30 tons per year. With the completion of this device, the production of photooxidation agent (PAG), which had been produced together with PHS, now has its own dedicated devices too. This marks the completion of a system with no blind spots for the product of next-generation materials.
