TOYO GOSEI


Challenge the bounds of Microfabrication


Photosensitive Materials Division

+81-3-5822-6180


Leading ppt level high purity photosensitive material manufacturing

TGC started the basic research of photosensitive material for the semiconductor pattern fabrication material in the middle of 1970’s predicted the growth of semiconductor market.
In 1981, TGC commercialized Photo Active Compound (PAC) for the positive and the material for the negative photoresist.
As LSI pattern size has been smaller, TGC has manufactured and sold photo acid generator (PAG) & base polymer for KrF chemically amplified resist since 1997.
To increase the product supply for the advanced materials, we built exclusive facility and started the operation for ArF resist polymer in 2001. Now, we drive the production technology development for the ppt level high purity material to meet the advanced technology requirement.


Support from Development to Commercialization

TGC is driving to build high quality management system as well as providing the high quality product to meet with the speed and cost by leading edge technology requirement.
TGC’s value to our customer is not only the product quality, such as raw material, production process, analytical process and people are all of our value.
TGC wants to be the company to grow with our customer together as providing our value through the entire process from the first stages of development to the volume manufacturing proactively.

High-performance & high-quality photosensitive materials
for ever higher fabrication densities

Semiconductors are made using lines that are narrowerthan viruses.

Semiconductor fabrication production is supported by very fine technique.
Thanks to the technology, it is possible to form under 40 nm width lines currently, which is far thinner than the 100 nm diameter of the influenza virus.


What are Photosensitive Materials Used in Photoresists?

TGC’s photosensitive materials are photoresist materials.
Photoresists are resins in which chemical change occurs only when exposed to light, and are essential materials in the manufacture of semiconductors and liquid crystal displays.
Photoresists are either of the positive type in which the portion exposed to light is dissolved, or the negative type in which the exposed portion is not dissolved, by the developer.

1The photoresist is applied thinly and uniformly to the
  substrate.



2The semiconductor circuit diagram and resist
  are illuminated (exposed) via a lens.

  Chemical change occurs only in the illuminated
  (exposed) portion.


3The substrate is developed in the developer.



Photosensitive Products


Positive-type Photosensitive Materials

Naphthoquinone-diazide compounds are employed as positive photoresist photosensitive materials, primarily in microfabrication of semiconductor integrated circuits and liquid crystal displays.
Apart from the following products, we are also able to supply esters (PAC) that are produced through the reaction of various naphthoquinone-diazide sulfonic acids and polyhydric phenols with levels of metals reduced to the order of ppb (parts per billion).

Representative Products


2,3,4-trihydroxybenzophenone

2,3,4-trihydroxybenzophenone

4-{4-[1,1-bis(4-hydroxyphenyl)ethyl]-α,α-dimethylbenzyl}phenol

4-{4-[1,1-bis(4-hydroxyphenyl)ethyl]-α,α-dimethylbenzyl}phenol

6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonic acid

6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonic acid




Negative-type Photosensitive Materials

Bisazido compounds are used as crosslinking agents for photoeffect resins employed primarily in the manufacture of color filters and semiconductor integrated circuits. We supply a range of high-purity bisazido compounds.



Photo Acid Generator

Microfabrication employs chemical amplification resists. We supply a range of high-purity photo acid generators (PAG) and resins employed in chemical amplifiers.
Apart from the following products, we are also able to manufacture and develop a range of photo acid generators and polymers at customer request.

Representative Products

TPS-TF

TPS-TF

DTBPI-PFBS

DTBPI-PFBS

TPS-CS

TPS-CS

TPS-PFBS

TPS-PFBS



Research and Development of Photosensitive Materials

Research and Development of Photosensitive MaterialsPhotosensitive materials are available in a wide range of types with differing capabilities. They are classified by photosensitive wavelength, for example, visible rays, ultraviolet light, excimer laser (far-infrared), extreme ultraviolet (EUV), X ray, and electron beam, and are classified by positive and negative types in solubility in the developer following exposure. They are also be classified as oil or water soluble. We supply photosensitive materials in this wide range of types. For example, we have developed and manufactured more than 100 derivatives of naphthoquinone-diazido, a photosensitive material used in microfabrication, in response to customer requests for the optimum photosensitive material. We are also working on the development of photo acid generators for the advanced ArF immersion and EUV exposure technologies.



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